Kelin J. Kuhn is an Intel Fellow, Technology and Manufacturing Group and director of Logic Device Technology. Kuhn is the device lead of the pathfinding team responsible for the transistor architecture for Intel’s 22 nanometer (nm) process technology.
Kuhn joined Intel in 1997 as a front-end integration engineer working on Intel’s 0.35 micron process technology. She has been involved in Intel’s manufacturing process technology development for several generations of process technology including Intel’s 45nm process technology. Kuhn was the device lead for Intel’s 45nm process, which uses Hi-K metal gate transistors and represents the most significant change in transistor architecture in the past 40 years.
Previously, Kuhn was a tenured faculty member in the Department of Electrical and Computer Engineering at the University of Washington. She has also held positions at the Boeing High Technology Center, Stanford University and Lawrence Livermore National Lab, among others. She has five patents with five others pending and is the author of more than 60 technical papers and a textbook.
Kuhn earned her bachelor’s degree in electrical engineering from the University of Washington in 1980. She received her master’s and doctoral degrees in electrical engineering from Stanford University in 1985.
