Finley Shapiro is a Hertz Fellow who earned his Ph.D. in electrical engineering from MIT, where his fellowship began in 1980. His doctoral research examined the computer simulation of the transient response of amorphous silicon hydride devices—an important class of thin-film semiconductor materials used in solar cells and flat-panel displays. Shapiro earned both his undergraduate and doctoral degrees from MIT. His work on amorphous silicon device simulation contributed to the understanding of thin-film transistor behavior in early flat-panel display technology.
Finley Shapiro, PhD
1980 HERTZ FELLOW
MAKING HISTORY
EDUCATION
Graduate Studies
Massachusetts Institute of Technology
Electrical Engineering
Graduate Thesis
Computer Simulation of the Transient Response of Amorphous
Silicopn Hydride Devices
Undergraduate Studies
Massachusetts Institute of Technology
IMPACT STORY
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READ MOREGET IN TOUCH WITH Finley Shapiro
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